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Innovation、Integration、Solutions - MOS Technology Inc.

Laser Micro Machining 雷射精微加工系統

 
microPRO™ RTP - Selective Laser Annealing System for Semiconductor Applications

The microPRO™ RTP, a new laser annealing system designed to enable several key process steps in semiconductor, power device and MEMS manufacturing, combines a state-of-the-art laser optic module with 3D-Micromac’s modular semiconductor wafer manufacturing platform. It provides selective annealing with high repeatability and throughput in a versatile system.

Features:
  • Selective in horizontal and vertical direction
  • Very high temperature gradients for low thermal budget
  • Determined absorption depth by wave length selection
  • Excellent energy homogeneity
  • Spot can be formed as required
  • Dynamic spot motion
  • Precise laser and process monitoring
  • Various options with pulse length, pulse energy and overlap
Suited for:
  • Magnet Sensor Processing, GMR (Giant magneto resistive) & TMR (Tunneling magneto resistive)
    Objective: Formation of monolithic magneto resistive devices with different orientation in one chip
  • Configuration for Ohmic Contact Formation (OCF)
    Objective:
    - Formation of a strong and low ohmic metal interface on backside of a wafer
    - Curing of mechanical damage after thinning process
    Note: SiC devices are getting thinner, flash annealing is no longer an option!
  • Dopant Activation by line scan
  • Objective: Formation of a field stop layer in IGBT by moving dopants to a well defined position
 
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Innovation、Integration、Solutions - MOS Technology Inc.
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