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Pulsed Light Sintering R&D System

*FEATURES* High peak energy for millisecond sintering Low heat surface treatment Illumination area options -Circular: 5.50" dia. - Linear: 1" x 16" Lamp spectrum: UV/Visible - 200 nm to 1000 nm Modular - ease of installation Lamp instant ON/OFF – no warm-up time

		Researchers working with functional nanotechnology materials in the field of Printed Electronics have a new resource available. The RC-847 from Xenon uses high peak energy, pulsed light technology that allows conductive nanoparticles to be heated and fused at room temperature without significantly heating the substrate or adjacent thermally sensitive components. Model RC-847 provides a high energy, pulsed light for reliable, repeatable sintering of conductive nanomaterials on heat sensitive materials. The RC-847 system features a high intensity pulsed xenon lamp that provides a broadband spectrum, from 200 nm to 1000 nm with 505 Joules/pulse energy. Sintering at room temperature The printed electronics market is in a transition as developments in new materials drive applications from R&D toward production. Functionally conductive inks and coatings are being manufactured with nanoparticles for use with low- temperature, low cost substrates such as paper, PET and polyethylene films. Printing on flexible substrates such as printed circuit boards, at room temperature, is becoming a reality. The challenge facing producers of evolving nanoparticle inks is how to sinter or anneal these inks at temperatures typically below 160 C° to prevent damage to the substrates. Pulsed light technology from Xenon offers the solution! The high peak energy pulse, delivered in milliseconds, quickly heats the inks and not the substrate. The high energy removes the solution and leaves just the metal flakes which are sintered or annealed. The substrate is not affected by the pulsed light. The flexibility of Xenon’s RC- 847 offers the ability to customize a system to match the sintering needs of a range of Ag and Cu nanoparticle inks on low heat substrates. Optional lamp housings offer different illumination areas. Model LH-810 exposes a 5.5" dia. area while model LH-840 exposes a 1" x 16" linear area.

SPECIFICATIONS- MODEL RC-847 with lamp options

All specifications are typical unless otherwise noted (TAMBIENT @ +25°C, VINPUT = 208 Vrms)

Lamp Spectra
The Xenon lamp inherently produces a broadband, UV/Visible spectrum from 200 nm to 1000 nm. Lamps are available with three different spectral cut-offs, producing unique wavelength properties suitable for different substrate materials. Lamp spectral cut-off wavelengths are shown below:

For more than 45 years,
Xenon has provided high-energy pulsed-light lamps and systems for the production of medical devices, optical storage media, displays and semiconductors. We’re experienced at solving curing problems requiring low-temperature solutions. And in emerging applications, such as sintering nanoparticle inks on low- temperature substrates and the low-temperature curing of thin-film substrates (e.g. organic photovoltaic, OLED displays and multi-layer flexible circuits), we have developed products with extraordinary ranges of power and system flexibility. Our engineers will help you configure your ideal solution. We invite you to visit our labs and bring your application with you or contact us to arrange a conference call with our engineers. At Xenon, we step our customers through the discovery process of pulsed light. And we’re ready to work with you to make your application a success.