CORIAL Series are systems which can be equipped either with reactive ion etching reactors (RIE) or high density plasma reactors (HDP and ICP) as well as PECVD. All have a wide range of working conditions allowing highly uniform processes on large areas(200 ~ above320 mm diameter) and can be equipped with vacuum load-lock for 19 X 2” wafers, 7 X 4” wafers or 300 mm wafers.