CORIAL is a process company that designs and manufactures plasma etching and deposition systems with innovative solutions dedicated to the semiconductor compounds, optoelectronics, LED, OLED and MEMS industries. The modular approach from RIE to highly sophisticated High Density Plasma systems with vacuum load-lock.
CORIAL Series are systems which can be equipped either with reactive ion etching reactors (RIE) or high density plasma reactors (HDP and ICP) as well as PECVD. All have a wide range of working conditions allowing highly uniform processes on large areas(200 ~ above320 mm diameter) and can be equipped with vacuum load-lock for 19 X 2” wafers, 7 X 4” wafers or 300 mm wafers.
Corial 300 IL – Perfect solution for PSS
• Large area ICP source for 19 X 2” or
7X 4” wafers
• High throughput ≥25,000
2” wafers/month @ 1.5 um height
• More than 500 runs before
maintenance
• Less than 2 hrs maintenance cycle
with D.I. water wipe only
• Remote control for real time process
support
Innovation、Integration、Solutions - MOS Technology Inc.
