Highlights of CORiAL
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New compact
products available Size= 75 cm wide X 108 cm deep |
New processes available |
Products Key Features |
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Corial 200FA Fast die deprocessing using HCD (Hollow Cathode Discharge) |
ICP of
Sapphire with
high throughput |
Highly
Versatile (many applications in the same process chanber) |
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Corial 200I ICP etcher for die/wafer deprocessing |
Fast ICP of GaAs/SiC via-holes | Stress control of high quality films |
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Corial
200ML ECR etcher for low damage etching |
Low damage GaN etching | Low Cost of Ownership |
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Corial
300IL 350 mm ICP etcher with load-lock special design for Sapphire etching! |
High
resolution Si etching (20 nm) |
Internet real time process support |
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Corial
400L Large area RIE etcher with load-lock for OLED made on 14"x14" substrates |
Deep Silicon etching (50 um) |
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Corial
D350L Large area PECVD tool (300 mm) with vacuum load-lock operating at 325oC |
SiC and aSi-H deposition |
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Corial
200D Low temperature ICP PECVD tool with vacuum load-lock operating < 150oC |
Low
temperature deposition (< 150oC) |
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| Liquid sources available | ******** | |
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Superlattice deposition | ******** |
... Clicks to visit CORiAL website for further Products information